Semiconductor manufactures are engaged in the miniaturization and functional diversification of semiconductor diodes but at the same time performing research to increase the ingot diameter and standardization of the crystal growth process. The simulation tool developed by FEMAG allows the crystal growth research and development to embark on their ambitious mission to achieve crystal growth ingot targets. Without FEMAG simulation software the cost of innovating crystal growth silicon ingots is beyond imagination. Altogether 35 patents are referring to our FEMAG simulation software. FEMAG leadership is accuracy of the data computed i.e., matching the experimental predictions including the evolution of the interface shape during crystal growth with an accuracy of 5%.
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